Xiamen Hengxiang Refrigeration Equipment Co., Ltd.
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Tetrafluoromethane
Purity ≥99.99% Water ≤10 PPm
Acidity ≤ 0.1 PPm Vapor Residue≤ 100 PPm
PHYSICAL PROPERTIES
| Chemical Formula | CF4 | Molecular Mass | 88.005 |
| Boiling Point (1atm/℃) | -128.05 | Critical Temperature (℃) | -45.64 |
| Critical Pressure (Mpa) | 3.75 | Critical Density (g/cm3) | 0.6257 |
| ODP | 0 | GWP | 5700 |
PACKING
Refillable steel cylinders 10L/40L/ISO-TANK
APPLICATION
Plasma etching gas, high-purity gas mixed with high purity oxygen gas can be used for cleaning the surface of the electronic device, detergent.
As a special ultra-low temperature refrigerant, R14 is mainly used in cryogenic equipment (including scientific research refrigeration, medical refrigeration, etc.) which requires very low temperature. R14 is also an important component of ultra-low temperature and refrigerant. Carbon tetrafluoride (tetrafluoromethane) is the most widely used plasma etching gas in the microelectronics industry. Its high purity gas and high purity gas of tetrafluoromethane and high purity oxygen can be widely used in silicon and silicon dioxide. The etching of thin film materials such as silicon nitride, phosphosilicate glass and tungsten is also widely used in surface cleaning of electronic devices, production of solar cells, laser technology, gas phase insulation, leakage testers, and detergents in the production of printed circuits.
Introductions
R14, Carbon Tetrafluoride or Tetrafluoromethane, chemical formula CF4. R14 belongs to FC-type substances – there is no damage to the ozone layer, but there is a greenhouse effect; there is currently no restriction on the production and sale of R14 refrigerants and the re-addition of initial and after-sale equipment on new refrigeration equipment.
